Čistilna maska je ustvarjena posebej za kožo nagnjeno k aknam in nečistočam. Maska Clear Purifying Clay Mask matira masten sijaj, oži razširjene pore, preprečuje nastanek novih nečistoč in opazno pomirja rdečico.
Izboljšajte videz nečiste kože že po nekaj uporabah.
Aqua, Kaolin (absorbent), Bentonite (absorbent), Titanium Dioxide (texture enhancer/opacifier), Butylene Glycol (slip agent/hydration), C12-15 Alkyl Benzoate (solvent), Cetyl Esters (emollient), Magnesium Aluminum Silicate (absorbent), Glycerin (skin-replenishing), Illite (absorbent), Tapioca Starch (absorbent), Zea Mays (Corn) Starch (absorbent), Salicylic Acid (skin-soothing), Camellia Sinensis (Green Tea) Leaf Extract (antioxidant/skin-soother), Pyrus Malus (Apple) Fruit Extract (antioxidant), Chrysanthellum Indicum (Golden Chamomile) Extract (skin-soothing), Hydrolyzed Rhodophycea (Red Algae) Extract (skin-soothing/hydration), Chlorella Vulgaris (Algae) Extract (skin-soothing/hydration), Epilobium Fleischeri (Willowherb) Extract (skin-soothing), Vaccinium Myrtillus (Bilberry) Fruit Extract (antioxidant), Brassica Campestris (Rapeseed) Seed Oil (non-fragrant plant oil/skin-soothing), Allantoin (skin-soothing), Bisabolol (skin-soothing), Zinc PCA (skin-softening), Copper PCA (skin-softening), Lauroyl Lysine (amino acid-derived hydration), Sodium Lauroyl Sarcosinate (cleansing agent/emulsifier), Xanthan Gum (thickener), Citric Acid (pH adjuster), Sodium Citrate (pH adjuster), Sodium Chloride (thickener), Phenoxyethanol (preservative), Ethylhexylglycerin (preservative).